发明名称 Semi conductor device and process for fabrication of same
摘要 In a contact type image sensor prepared by disposing a plurality of sandwich type photoelectric conversion elements each of which is obtained by sandwiching an amorphous semiconductor layer as a photoelectric conversion layer between a metal electrode and a light-transmissive electrode, the amorphous semiconductor layer is insulated and separated by means of a silicon oxide layer in every element. The silicon oxide layer is obtained by oxidizing selectively the amorphous semiconductor layer in accordance with the optically assisted anodizing process.
申请公布号 US5084399(A) 申请公布日期 1992.01.28
申请号 US19880237687 申请日期 1988.08.25
申请人 FUJI XEROX CO., LTD. 发明人 TEI, SADAHIRO
分类号 H01L27/146;H01L31/20 主分类号 H01L27/146
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