| 摘要 |
PURPOSE:To suck mist which is scattered by the rotation of a semiconductor substrate and is left over without being sucked from a vacuum suction port installed inside a cup section completely by a cylinder-shaped electrostatic attraction plate placed at the upside of the cup section by installing the electrostatic attraction plate for mist at the upside of the cup. CONSTITUTION:This apparatus is equipped with a base material 2 to which a semiconductor substrate 1 is stuck by vacuum suction in a cup section, a rotary shaft 3 which has the base material 2 secured on the top, a pump 4 which attracts the base material 2 by vacuum suction force, a nozzle 5 which, being installed above the base material 2, drops a photosensitive resin liquid or a processing liquid in proper quantity on the surface of the semiconductor substrate 1, a cover 6 to prevent the scattering of the dropped chemical which is flung away by the rotation of the semiconductor substrate 1 and a vacuum suction port 7 installed inside of the cup section for mist. At the upside of the cup section, a cylinder-shaped electrostatic attraction plate 8 of the same diameter with that of the cup section is installed to be an anode. With the nozzle 5 or a main body of the equipment grounded to be a cathode, a high voltage is applied between the two poles by a high-voltage generating unit 9 to form an electrostatic field inside the cylindrical electrostatic attraction plate 8. |
