| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical waveguide aligner capable of dealing with a change in the required characteristics of an optical integrated circuit, and also to provide a waveguide and its manufacturing method. SOLUTION: The patterns P1-P3 of optical circuits constituting an optical integrated circuit are exposed in one wafer 6 for an optical waveguide, separately piece by piece with photomasks PM1-PM3. As a result, even if a change occurs in the required characteristics of the integrated circuit, it can be dealt with by replacing only the photomask PM1 of the pattern P1 related to the change with other photomask PM4 to be changed, and then by merely exposing the photomasks PM2-PM4 separately in one wafer for the optical waveguide. Consequently, need to remake one photomask is eliminated in which a plurality of optical circuit patterns are formed as in the conventional technique. COPYRIGHT: (C)2005,JPO&NCIPI |
