MASK AND EXPOSING DEVICE AND METHOD USING MASK

摘要

PURPOSE:To improve the transfer accuracy of a complicated and fine pattern formed on a mask by irradiating 1st and 2nd patterns on the mask with two light beams which have phase difference respectively and are at least partially coherent. CONSTITUTION:The 1st and the 2nd patterns 9a and 9b on the mask 9 where the 1st and the 2nd patterns 9a and 9b are constituted are irradiated with the two light beams 1 which have the phase difference respectively and are at least partially coherent so that light beams transmitted through the transmissive areas of the 1st and the 2nd patterns 9a and 9b may interfere and weaken each other at the boundary part where the accuracy of a desired pattern is required. Then, the transmission patterns of the light beams are composited to generate the desired pattern on a sample 15 to be irradiated. Thus, the transfer accuracy of the boundary part where the accuracy of the desired pattern is required is improved.