| 摘要 |
PURPOSE:To produce an extremely thin cell of a large size by irradiating a photosetting compsn. layer with electromagnetic waves or particle beams in a desired pattern shape, then developing and removing uncured parts, sticking two sheets of substrates to each other to form a cell and further similarly irradiating the remaining photosetting compsn. CONSTITUTION:A color filter layer 2 and a metallic wirings 3 are provided on a substrate and all or a part of a passivation film 4, a transparent electrode 5, an insulating film 6 and a wiring film 7 are successively provided. The spacing of the cell is set by the photosetting compsn. 9 patterned at a prescribed film thickness or the spacer particles dispersed supplementally in the photosetting compsn. 9. The photosetting compsn. layer 9 is irradiated with the electromagnetic waves or particle beams in the desired patterns and thereafter the uncured photosetting compsn. 9 of the unirradiated parts are developed and removed. Two sheets of the substrates are stuck to each other to form the cell and further, the photosetting comspn. 9 remaining in the irradiated pats is irradiated with the electromagnetic waves or particle beams or/and is heated. The cell of the large size and thin cell spacing is produced in this way. |
