发明名称 X-RAY EXPOSURE APPARATUS
摘要 PURPOSE:To enable uniformization of exposure as well as elimination of blurs by vibrating a planar mirror at an equal speed by a vibration means so as to enter parallel synchrotron radiated light reflected by a toroidal mirror into the planar mirror. CONSTITUTION:This invention comprises a toroidal mirror 3 which enters synchrotron radiated light 1 and converts it into parallel light, a planar mirror 5 which enters and reflects synchrotron radiated light 4 reflected by the toroidal mirror 3, a vibration means 6 which vibrates the planar mirror 5 at an equal speed in the direction of parallel transfer without changing the angle of incidence of the synchrotron radiated light 4, and a stepper 10 holding an X-ray mask 8 which enters and selectively reflects synchrotron radiated light 7 reflected by the planar mirror 5 and an exposure object 9 which is exposed to synchrotron radiated light penetrating the X-ray mask 8 for free alignment of both. For example, the vibration means 6 is so designed as to vibrate the planar mirror 5 in the direction of optical axis of the synchrotron radiated light 4 reflected by the toroidal mirror 3.
申请公布号 JPH0417321(A) 申请公布日期 1992.01.22
申请号 JP19900119974 申请日期 1990.05.11
申请人 TOSHIBA CORP 发明人 SUMIYA MITSUO
分类号 G21K1/06;G03F7/20;H01L21/027;H05G2/00;H05H13/04 主分类号 G21K1/06
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