Process and apparatus for modifying a surface in a work region

摘要

An apparatus and process for manufacturing changes of a substrate in a work region which is 100x100x100 microns or smaller is described. The apparatus uses a plasma source adjacent to the work region to produce radiation or matter which changes the surface. An atomic force microscope or laser can be used in addition. The process and apparatus can be used to produce MEMS devices on a substrate for use in a wide variety of applications.