发明名称 |
Double-sided radiation-assisted processing apparatus |
摘要 |
A double-sided radiation-assisted processing apparatus includes a planar radiation source having first and second sides and providing radiation having an intensity IO at the surface of substrates provided on both the first and second sides of the radiation source. Accordingly, the radiation intensity utilized for processing is 2IO.
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申请公布号 |
US5083030(A) |
申请公布日期 |
1992.01.21 |
申请号 |
US19910668734 |
申请日期 |
1991.03.12 |
申请人 |
APPLIED PHOTONICS RESEARCH |
发明人 |
STAVOV, VLADIMIR |
分类号 |
B01J19/12;C23C16/48;C23G5/00 |
主分类号 |
B01J19/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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