发明名称 DUMMY WAFER
摘要 PURPOSE:To enable the errors in the alignment system to be automatically corrected while enhancing the durability by a method wherein an organic photochromic material in excellent coloring sensitivity is used as the sensing material. CONSTITUTION:The title dummy wafer is provided with the first layer comprising a resin containing 30-80wt.% of organic photochromic material as well as the second layer comprising a transparent electrode material. In order to form the first layer, a bare silicon or a substrate such as a silicon wafer etc., processed with evaporation etc., and coated with a coating solution is heat- treated in an inert gas atmosphere. Accordingly, the coloring concentration can be augmented while extending the term until the wafer is discolored. Furthermore, the alignment can be made efficiently using the dummy wafer whose second layer is formed of the transparent electrode material. Through these procedures, the title dummy wafer can be provided with excellent stability, enhanced durability while enabling the high precision alignment to be made easily.
申请公布号 JPH0412522(A) 申请公布日期 1992.01.17
申请号 JP19900115084 申请日期 1990.05.02
申请人 CANON INC 发明人 NAKATSUI HISASHI
分类号 H01L21/30;H01L21/027 主分类号 H01L21/30
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