Method of developing presensitized offset printing plates and developing solution used in that method.

摘要

A developing solution of an imagewise exposed, presensitized offset printing plate is disclosed. The developing solution has a pH of at least 12.5, and contains a silicate in an amount of up to 1.0 wt% as SiO2, a surfactant in an amount of 0.01 to 10 wt%, an aromatic carboxylic acid in an amount of 0.1 to 10 wt%, and an amine coumpound represented by the following general formula (I) in an amount of 0.1 to 10 wt%: R1 - N(R2) - J - OH (I> wherein R1 and R2 are each independently a hydrogen atom, a group -C2H4OH or a group -C3H6OH; and J is a group -C2H4-or -C3H6-.