发明名称 MOS-type semiconductor device and manufacturing method thereof.
摘要 A semiconductor device comprises source, channel and drain regions arranged generally vertically, and the channel and drain regions have special parts which are of the same conductivity type as the channel and drain regions respectively but highly doped, and these highly doped special parts adjoin each other. Such a device can control load current freely and smoothly while withstanding high drain voltages. <IMAGE>
申请公布号 EP0466508(A1) 申请公布日期 1992.01.15
申请号 EP19910306356 申请日期 1991.07.12
申请人 MATSUSHITA ELECTRONICS CORPORATION 发明人 KAYAHARA, AKIHIRO 1-7 TOBUSHI-CHO;KAWASHIMA, ISAMU 479 OHOAZA KAWANAMI;TANIDA, HIROSHIY 18-24-105 URADOUHONNMACHI;YAMANISHI, YUYI 11-504 SHIMEIEN
分类号 H01L21/336;H01L21/8249;H01L27/02;H01L27/04;H01L29/06;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址