| 摘要 |
PURPOSE: To unnecessitate a special process for mask production by exposing a complementary gray scale through a partial mask having a negative transparency gradient corresponding to the gray scale to be formed and to be gradually increased at the terminal part of a transparent area. CONSTITUTION: By the 1st exposure through the 1st partial mask to connecting blocks 7 and 8, the gray scale to be gradually increased toward a terminal part 7 is formed at a 1st detail half part 5 of a photoresist layer 4 and next, by the 2nd irradiation through a 2nd partial mask 2, a 2nd detail half part 6 having the gray scale to be gradually increased toward the terminal part corresponding to the 1st detail half part 5 is formed at the photoresist layer 4. Then, the gray scale is complemented with the gray scale formed at a terminal part 8 of the 2nd detail half part 6 during the 1st exposure, the 1st and 2nd terminal parts 8 and 7 are overlapped, and the entire detail is completely exposed at the connecting areas 7 and 8 by these two times of exposure. Thus, the special processing process is not required for producing the mask. |
