| 摘要 |
PURPOSE:To prevent the sticking of moisture and low volatile components to a mask surface during storage even if a slight amt. of stains remain at the time of washing of the mask by forming the hydrophobic mask surface by the chemical reaction with the OH groups on the surface. CONSTITUTION:The hydrophobic film formed by the trimethylsilyl reaction of the OH groups of the surface of the photomask and 1, 1, 1, 3, 3, 4- hexamethyldisilazane (A) is formed on the surface. This film is preferably hydrophobed by exposing the mask to a gaseous atmosphere contg. The compd. A or coating the mask with a processing liquid contg. the compd. A. |
