| 摘要 |
PURPOSE:To obtain the above head having a track width of high accuracy by forming a mask material for etching an upper magnetic film and specifying the side face tape angle of the part of the mask material in contact with the upper magnetic film to a prescribed value. CONSTITUTION:An alumina film 98 as an underlying film, a 'Permalloy(R)' film 92 as a lower magnetic film, an alumina film 93 as a gap film, copper 99 as a conductor coil, and an org. resin film 94 as an insulating film are formed on the upper part of a substrate 91. A 'Permalloy(R)' film 95 as the upper magnetic film, an alumina film 96, and a 'Permalloy(R)' film 100 to serve as the mask material for alumina etching are formed thereon. A photoresist 97 is then applied thereon to form patterns. The film 100 is succession patterns by ion beam etching using gaseous Ar with the photoresist 97 as the mask material and the alumina film 96 is patterned by an ion beam etching method using gaseous 20vol.% CH2F2+CHF2. The film 95 is etched by the ion beam etching method using gaseous Ar with the film 96 as the mask to form the upper magnetic film pattern. The thin-film magnetic head having the track width of the high accuracy is thus obtd. |
