MANUFACTURE OF ELEMENT HAVING PATTERN STRUCTURE

摘要

PURPOSE:To form a fine circuit pattern without generating failures in pattern resolution by dividing a continuous opening pattern to constitute a partial pattern having openings respectively separated by light shields and by periodically giving phase difference to rays of illuminating light penetrating through openings. CONSTITUTION:A partial pattern 9 is constituted by splitting a continuous opening pattern so that openings may be isolated by light shields 7. This partial pattern 9 is phase shift layers 5 alternately at adjacent openings on a photomask. Rays of illuminating light penetrating through the opening pattern on the photomask become those which show 0 deg. phases in opening pattern regions 86 and 180 deg. phases in phase shift layer regions 5. Changing the opening into the partial pattern prepared by isolation prevents the phase of the ray of illuminating light from rapidly changing 0 deg. 180 deg. and generating such a boundary that causes failures in pattern resolution. When the pattern is transferred onto a substrate wafer using this phase shift reticle, grating part pattern c and hole part pattern d are resolved.