发明名称 MANUFACTURE OF PHOTOMASK
摘要 PURPOSE:To easily and exactly form 2 wiring pattern diagrams corresponding to each color from an original wiring pattern diagram expressed in 2 colors, by using 2 kinds of photosensitive films having different photosensitive wavelength regions. CONSTITUTION:Two kinds of patterns are separated from a wiring pattern diagram expressed in 2 colors (diagram A) having a lateral red pattern (diagram B) and a longitudinal blue pattern (diagram C) drawn on the same paper, and lateral and longitudinal thin continuous lines are graph paper lines. (i) An orthochromatic photosensitive film 1 having a 350-600nm photosensitive wavelength region is placed under the diagram A, and white light is projected in the arrow direction to react a part of the film 1 except that corresponding to the red pattern R and the black pattern BL (hatched parts, and a signal B expresses the blue pattern), and then, the film 1 is reversely printed on a positive film 2 to form a red and black pattern. A blue and black pattern is formed by using a panchromatic photosensitive film 3 having a 350-650nm photosensitive wavelength region, and a light filtered through a red film 4.
申请公布号 JPS5738434(A) 申请公布日期 1982.03.03
申请号 JP19800113953 申请日期 1980.08.21
申请人 FUJITSU LTD 发明人 KOJIMA ISAO
分类号 G03F1/00;G03F1/68;H01L21/027 主分类号 G03F1/00
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