发明名称 METHOD FOR CALCINING PLZT
摘要 PURPOSE:To suppress the generation of residual pores and to obtain PLZT wafers having sufficient light transmissivity by alternately superposing the PLZT wafers and porous plates right above these PLZT wafers apart spacings provided between the wafers and the plates, then calcining the PLZT wafers. CONSTITUTION:The spacings are respectively provided between the plural PLZT (transparent ceramics) wafer and the plural porous plates 2 exisiting right above the PLZT wafers 1. The plural porous plates 2 are superposed on each other via supporting pieces 4 thicker than the thickness of the PLZT wafers 1 placed therebetween. The PLZT wafers 1 are placed on these porous plates 2 every time these PLZT wafers 1 are superposed. The superposed PLZT wafers 1 and porous plates 2 are placed in a container 3 and after the container 3 is capped, the wafers are subjected to atmosphere calcination. Since spacers exist in the upper parts of the respective PLZT wafers 1, the control of a flow passage (gaseous O2 atmosphere) of gaseous O2 and a PbO atmosphere are possible. The plural PLZT wafers 1 obtd. by such calcination do not generate residual pores and have the sufficient light transmissivity.
申请公布号 JPH046164(A) 申请公布日期 1992.01.10
申请号 JP19900106991 申请日期 1990.04.23
申请人 FUJITSU GENERAL LTD 发明人 OMURA KINGO
分类号 C04B35/49;C04B35/64;H01B3/12 主分类号 C04B35/49
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