发明名称 PRODUCTION OF PHOTOMASK AND SEMICONDUCTOR DEVICE
摘要 PURPOSE:To decrease the kinds of pellicle frames for a stepper by half and to simplify a production line by equaling the height of the two pellicle frames. CONSTITUTION:A pellicle film 15 consists of a transparent thin film represented by nitrocellulose and is fixed to cover and protect chromium 12 on a reticule 11 via the pellicle frames 13, 14 consisting of an aluminum alloy, etc. The heights of the pellicle frames 13, 14 of the respective surfaces are equaled. Although there are no limitations in the height of the pellicle frames 13, 14, the height is preferably determined from the degree of cleanness, etc., in a factory or in the stepper. The kinds of the pellicle frames 13, 14 are decreased in this way, by which the production cost is reduced and the production is simplified.
申请公布号 JPH047551(A) 申请公布日期 1992.01.10
申请号 JP19900109195 申请日期 1990.04.25
申请人 SEIKO EPSON CORP 发明人 SUGIMOTO NAOAKI
分类号 G03F1/64;H01L21/027 主分类号 G03F1/64
代理机构 代理人
主权项
地址