发明名称 GAS PURIFICATION DEVICE
摘要 <p>PURPOSE: To contrive to remove a trace of impurities in hydrogen gas or the like by filling up an active substance in an airtight chamber around a filter and an inside space section and by bringing the gas which is moving from an inlet-side filter to an outlet-side filter through the airtight chamber into contact with the active substance. CONSTITUTION: An airtight inside space section positioned between filters (20, 21) in an airtight chamber (C) is formed. In this airtight chamber (C), a baffle (24) is installed between the filters (20, 21) facing an annular side wall. And, a gas passing through inbetween the filters (20, 21) is deflected along the circumference of the baffle (24) from an inlet (18) to an outlet (19). Further, a heater (16) is mounted inside the said inside space section, and an outside vessel (27) surrounding a main vessel (11 to 13) to form a space around it is installed. In order to thermally insulate the main vessel (11 to 13) from the outside vessel (27), a ceramic insulating plate (26) is mounted in the said space and an active substance (25) (example: Zr) which is to nearly fill up the airtight chamber (C) is placed in the surroundings of the filter (20, 21) and of the said inside space section.</p>
申请公布号 JPH044014(A) 申请公布日期 1992.01.08
申请号 JP19900102762 申请日期 1990.04.18
申请人 EEJIENITSUKUSU INC 发明人 POORU DAGURASU GUTSUDERU;ROORENSU SHII MITSUCHIERU
分类号 B01D53/04;B01J8/02 主分类号 B01D53/04
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