发明名称 CONTINUOUS PROCESSOR OF WAFER
摘要 <p>PURPOSE:To prevent deposits of foreign matters on a wafer during transfer by making the first robot carry a wafer to the relay port and immediately reset to the home position after the first processor receives a response message of material delivery request and next by making the second robot fetch the wafer from the relay port after communicating the material fetch request and the response message. CONSTITUTION:A second processor 12 sends a message S4F17 of wafer delivery request to a first processor 11 when the transfer-in port 12a comes out of a wafer 1. The first processor 11 sends its response message S4F18 to the second processor 12. Then, the first processor 11 sends a message S4F1 of wafer fetch request to the second processor 12, which sends a response message S4F2 to the first processor 11. The second processor 12 in turn sends a message S4F3 of fetch-ready end to the first processor 11, further moves the arm of the second robot 12b from the home position to the relay port 13 to vacuum suck it by the rear of a wafer 1, and then moves the arm to the transfer-in port 12a to release the suction and mount the wafer 1 on the transfer-in port 12a.</p>
申请公布号 JPH043955(A) 申请公布日期 1992.01.08
申请号 JP19900106059 申请日期 1990.04.20
申请人 FUJITSU LTD 发明人 KIRISAKO TADASHI
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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