Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations

摘要

The present invention is directed to negative cross-linking photoresist formulations containing nonphotoactive cross-linking agents, such as, but not limited to, the CYMEL 300 series, and to the use of these formulations specifically for the dry development of the so-treated resists as positive tone images following their vapor phase treatment with suitable organometallic materials, e.g., HMDS.