Photosensitive electron-pptn. coating mass - obtd. using photosensitive cpd. contg. quinone di:azide sulphonic acid units and water-soluble or -dispersible resin

摘要

Positive, light-sensitive, electro-pptn. coating masses contain (a) a photosensitive cpd. of mol. wt. not greater than 6000 comprising at least one modified quinonediazide sulphonic acid unit of general formula R1-N(R2)-R3-A- (I) (where R1 = a gp. of formula (II) or (III); R2 = H, alkyl, cycloalkyl or alkylether; R3 = alkylene, cycloalkylene or alkylene ether, and A = a carboxylic acid ester; and (b) a water-soluble or water-dispersible resin contg. a salt-forming gp.. (I) is pref. obtd. by reaction of poly-acid-chlorides with a hydroxyl-contg. quinonediazide of formula R1-N(R2)-R3-OH. The photosensitive cpd. (a) pref. contains, on average, 1-5 modified quinonediazide sulphonic acid units of formula (I) in each molecule, and (a) is pref. of mol. wt. not exceeding 5000. USE/ADVANTAGE - For prodn. of circuit photoresists for conductor plates for integrated switching circuits. The photoresists exhibit enhanced sensitivity to actinic rays, e.g. UV-light, and enhanced electro-pptn. bath stability.