MANUFACTURING METHOD FOR ARRAY SUBSTRATE

摘要

A manufacturing method for an array substrate, comprising: performing a half-tone mask process or a gray-tone mask process, removing an insulating layer (2) corresponding to a fully transparent area (81) of a mask (8), removing a photoresist layer (7) corresponding to a partially transparent area (82), an reducing the thickness of the insulating layer (2) corresponding to the partially transparent area (82); removing an electrically-conductive layer (1) of an area not covered by the insulating layer (2) and forming the structure of the electrically-conductive layer (1); and, removing the remaining photoresist layer (7) and the insulating layer (2) corresponding to the partially transparent area (82).