POSITIVE WORKING DRY FILM ELEMENT HAVING A LAYER OF RESIST COMPOSITION
摘要
This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
申请公布号
US5077174(A)
申请公布日期
1991.12.31
申请号
US19900507337
申请日期
1990.04.10
申请人
E. I. DU PONT DE NEMOURS AND COMPANY
发明人
BAUER, RICHARD D.;CHEN, GWENDYLINE Y.;HERTLER, WALTER R.;WHELAND, ROBERT C.
