发明名称 |
ANTISTATIC AND ELECTRICALLY CONDUCTIVE RELIEF IMAGES, PROCESSES FOR THE PRODUCTION THEREOF, COATING AGENTS AND RADIATION-SENSITIVE POLYMERS |
摘要 |
Substrates which have been coated with a mixture of a radiation-sensitive organic material, an unsubstituted or substituted tetrathio-, tetraseleno- or tetratelluro-naththalene and/or -tetracene and a substance containing active Cl, Br and/or I atoms, form radiation-sensitive layers with electrically conductive charge transfer complexes under the action of thermal energy. Irradiation under an image mask and subsequent development give antistatic or electrically conductive relief images which can be used, for example, as electrodes or conductive connections for electronic components.
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申请公布号 |
US5077156(A) |
申请公布日期 |
1991.12.31 |
申请号 |
US19890411947 |
申请日期 |
1989.09.25 |
申请人 |
CIBA-GEIGY CORPORATION |
发明人 |
FINTER, JUERGEN;HILTI, BRUNO;MAYER, CARL W.;MINDER, ERNST |
分类号 |
G03F7/004;C08G59/00;C08K5/48;C08L33/04;C08L33/16;C08L63/00;C08L71/08;C08L71/10;C08L101/00;C09D179/08;G03F7/027;H01B1/12 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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