| 摘要 |
An apparatus is described which controls the movement and positioning of a platen on which wafers may be mounted. The apparatus comprises a stepper motor having a motor sprocket member operatively coupled to a platen by a drive mechanism. The drive mechanism comprises a chain which cooperates with the the stepper motor by engaging with the motor sprocket member. The drive mechanism also comprises a platen chain sprocket having a platen shaft member. The platen is movably connected to the platen shaft member. The chain cooperates with the platen by engaging with the platen chain sprocket. Operation of the stepper motor rotates the motor sprocket member and drives the drive mechanism, thereby rotating the platen chain sprocket and determining the movement and positioning of the platen. The apparatus is capable of controlled movement and positioning of the platen inside processing equipment, such as ion implantation equipment.
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