发明名称 |
FREMGANGSMAADE TIL AT HOLDE ET SUBSTRAT PAA PLADS I EN HOLDER FOR FOTOLITOGRAFISK BEHANDLING |
摘要 |
A method of captivating a substrate within a holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymerized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process. |
申请公布号 |
DK161610(C) |
申请公布日期 |
1991.12.30 |
申请号 |
DK19830005352 |
申请日期 |
1983.11.23 |
申请人 |
MOTOROLA INC. |
发明人 |
DWORSKY, LAWRENCE NOAH;SCANSAROLI, MICHAEL NICHOLSON;SHANLEY, CHARLES WILLIAM;WHALIN, JEFFREY ALDEN |
分类号 |
H01L21/027;G03C;G03C5/00;G03F7/00;G03F7/20;G03F7/26;G03F9/00;H01L21/30;H05K3/00;H05K3/06 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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