WAFER HEATERS FOR USE IN SEMI-CONDUCTOR-PRODUCING APPARATUS, HEATING UNITS USING SUCH WAFER HEATERS, AND PRODUCTION OF HEATERS

摘要

A wafer heater for use in a semiconductor producing apparatus includes a discoidal substrate (6) made of a dense ceramic, and a resistance heating element (7) buried in the substrate. The surface of the substrate upon which a wafer is to be placed for heating is flat. A hollow sheath (12) whose inner pressure is not substantially varied even when the pressure inside the chamber (2) is joined to the substrate (6), and a thermocouple (14) is inserted into said hollow sheath.