发明名称 SUCTION DEVICE OF SEMICONDUCTOR SUBSTRATE
摘要 <p>PURPOSE:To enable a semiconductor substrate suction device to be rotated as it sucks a semiconductor substrate by a method wherein a semiconductor substrate sucking section provided with a suction hole is fitted to the tip of a rod in a rotatable manner. CONSTITUTION:A vane 8 is fitted to a rotary part 12 of a sucking part 5, and air is blown against the vane 8. Air required for rotating the vane 8 is supplied from a nozzle through which air is taken in from outside. Air rotating the vane 8 is forcibly exhausted outside through an exhaust pipe 10, and the rotation of the vane 8 is controlled by an exhaust switch 11 inserted at the intermediate point of the exhaust pipe 10. Photosensors are arranged on a part of a rod 3 in lines so as to automatically detect an orifra 7, whereby the orifra 7 is detected and automatically positioned even if a semiconductor substrate 4 is sucked by the suction part 5 off its center.</p>
申请公布号 JPH03295254(A) 申请公布日期 1991.12.26
申请号 JP19900097189 申请日期 1990.04.12
申请人 MATSUSHITA ELECTRON CORP 发明人 NARAOKA HIROKI
分类号 H01L21/677;H01L21/68 主分类号 H01L21/677
代理机构 代理人
主权项
地址