| 摘要 |
PURPOSE:To industrially produce a grain-oriented silicon steel sheet having very small iron loss at a low cost by forming an oxide film on the matrix iron surface of a finish-annealed grain-oriented silicon steel sheet by low pres sure plasma spraying. CONSTITUTION:A forsterite film on a finish-annealed grain-oriented silicon steel sheet contg. about <=4wt.% Si is chemically or mechanically removed to expose the matrix iron in the surface of the steel sheet and an oxide film is formed on the resulting matrix iron surface by low pressure plasma spraying with powder of alumina, silica, mullite, etc. The base is then preferably heated to about 800 deg.C so as to relieve the strain of the base and that of the oxide film. After the oxide film is formed, a tension applying film is further formed by coating and baking as required. A grain-oriented silicon steel sheet having very small iron loss can industrially be produced at a low cost. |
