| 摘要 |
PURPOSE:To alleviate influence of a thermal stress with adhesive and a stress at the time of contraction and to form an X-ray mask for accurately forming parallel surfaces on a mask surface and a wafer by holding the mask between first and second bases having highly flattened surfaces, and adhering a mask board to a supporting frame while holding an interval between the bases at a predetermined value. CONSTITUTION:A mask board 2 having a surface formed with a mask pattern and including high flatness, and a supporting frame 1 for securing the board 2 through adhesive 6 are provided. The mask 2 is held between two bases 12 and 17 having highly flattened surfaces, and both are aligned before the adhesive 6 between the board 2 and the frame 1 is cured. The parallel interval of high accuracy is held until the adhesive 6 is cured in this state. Thus, an X-ray mask in which the mask surface opposed to the wafer and the mask chuck mounting surface of opposite side thereto are accurately disposed in parallel, is adhesively assembled. |
