| 摘要 |
PURPOSE:To industrially produce a grain-oriented silicon steel sheet having very small iron loss at a low cost by plating the matrix iron surface of a finish annealed grain-oriented silicon steel sheet with a metal and forming an oxide film by low pressure plasma spraying. CONSTITUTION:The matrix iron surface of a finish-annealed grain-oriented silicon steel sheet contg. about <=4wt.% Si is plated with a metal. This matrix iron surface is formed by chemically or mechanically removing a forsterite film formed by annealing so that the matrix iron in the surface of the steel sheet is exposed. By the metal plating, a plating layer of Zn, Sn, Cu or Ni is preferably formed in about >=1mum thickness. An oxide film is formed on the plating layer by low pressure plasma spraying. Alumina or silica may be used as the oxide. A tension applying film is further formed by coating and baking as required. The iron loss of the silicon steel sheet can remarkably be reduced with high productivity at a low cost. |
