发明名称 Composition and coating to prevent current induced electrochemical dendrite formation between conductors on dielectric substrate
摘要 The present invention comprises the use of a copper/nickel containing alloy composition or application of a protective nickel alloy coating to copper current-carrying leads to prevent electrolytic migration between tape automated bonding (TAB) package leads.
申请公布号 US5074969(A) 申请公布日期 1991.12.24
申请号 US19910666007 申请日期 1991.03.07
申请人 IBM CORPORATION 发明人 BREWER, WILLIAM D.;GREBE, KURT R.;HORTON, RAYMOND R.;MATTHEW, LINDA C.;NOYAN, ISMAIL C.;PALMER, MICHAEL J.;PURUSHOTHAMAN, SAMPATH;RATH, DAVID L.
分类号 H01L21/48;H01L23/498;H05K1/00;H05K1/09;H05K3/24 主分类号 H01L21/48
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