| 摘要 |
NEW MATERIAL:A naphthoquinonediazidesulfonic acid derivative of formula I [D is 1,2-naphthoquinonediazide-4-sulfonyl or 1,2-naphthoquinonediazide-3- sulfonyl; R1, R2, R3 are H, 1-5C alkyl, CH2OR4 (R3 is H, 1-5C alkyl), aryl, nitro, nitrile, aldehyde, CO2R5 (R5 is 1-5C alkyl), CH2COOR6 (R6 is 1-5C alkyl), halogen]. EXAMPLE:A compound of formula II. USE:Useful as a component for radiation-sensitive resin compositions. The compound of formula I may be employed singly or together with any other radiation-sensitive compound, and is useful also for the preparation of semiconductors or for photoreaction-utilizing uses such as photolithography and printing plate materials. PREPARATION:Naphthoquinonediazidesulfonyl chloride is dissolved in an organic solvent, mixed with an imidazole compound and subsequently mixed with triethylamine with stirring to provide the compound of formula I. |
