发明名称 X-RAY MASK STRUCTURE
摘要 PURPOSE:To prevent it from creating the projections of X-ray transmitting material or the surface from having flaws or dust by providing the side of a silicon wafer substrate with a cut. CONSTITUTION:A cut is provided at the side face of a silicon wafer. The cuts to be provided at the side face of this silicon wafer substrate shall be provided at one place or more of the same silicon wafer substrate, and for the shape, any shape will do so long as it is not grounded to the surface of the substrate holder or the silicon wafer when holding the silicon wafer with the substrate holder.
申请公布号 JPH03289122(A) 申请公布日期 1991.12.19
申请号 JP19900090283 申请日期 1990.04.06
申请人 CANON INC 发明人 IKEDA TSUTOMU;SUGATA MASAO;KATO HIDEO
分类号 G03F1/22;G03F1/60;H01L21/027 主分类号 G03F1/22
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