| 摘要 |
PURPOSE:To reduce the dispersion of mask pattern distortion so as to prevent the drop in positioning accuracy or the drop in repeatability and reproducibility by performing the rotation and the sucking of the mask in the condition that the pressure is weakened, after pressing a mask frame at the specified pressure in the condition that it is erected approximately vertically to a positioning V block. CONSTITUTION:By the mask transfer instruction from a CPU, a mask band 13 also shifts in the direction of a mask stage 17, and a mask frame 14 is made to abut on a V block 18, and when it reaches the first pressure, it drives a pulse motor in the backward direction. This reverse sending is performed at the place where the pressure of the mask is equal or approximate to the second pressure (Ogf), and a pulse motor drive is stopped and the stage is rotated THETA. Next, the pulse motor is driven again, and the pressure to the V block is changed to the first pressure, subsequently the pule motor is driven in the backward direction, and the pressure to the V block is changed to the third pressure weaker than the first pressure, and when it reaches the third pressure, the motor drive is stopped, and a mask frame 14 is sucked and fixed by a mask chuck 14. |
