发明名称 |
Radiation-sensitive positive resist composition. |
摘要 |
<p>A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: <CHEM> wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.</p> |
申请公布号 |
EP0461654(A2) |
申请公布日期 |
1991.12.18 |
申请号 |
EP19910109727 |
申请日期 |
1991.06.13 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MORIUMA, HIROSHI;OSAKI, HARUYOSHI;HIOKI, TAKESHI;UETANI, YASUNORI |
分类号 |
G03F7/039;C07C39/15;G03F7/022;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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