发明名称 Radiation-sensitive positive resist composition.
摘要 <p>A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: &lt;CHEM&gt; wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.</p>
申请公布号 EP0461654(A2) 申请公布日期 1991.12.18
申请号 EP19910109727 申请日期 1991.06.13
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 MORIUMA, HIROSHI;OSAKI, HARUYOSHI;HIOKI, TAKESHI;UETANI, YASUNORI
分类号 G03F7/039;C07C39/15;G03F7/022;H01L21/027 主分类号 G03F7/039
代理机构 代理人
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