| 摘要 |
PURPOSE:To make improvement in heat resistance by depositing a titanium layer and an amorphous silicon layer on a substrate. CONSTITUTION:The amorphous silicon 14 (aSi) layer and the titanium 13 (Ti) layer are provided and are irradiated with radiations, such as laser beam 15, to form a titanium silicide 16 (TiSi2). The recording or reproducing of data is executed by generating a difference in the reflectivity between the aSi and the TiSi2. Namely, the reflectivity changes from 60% to 20% according to the presence of absence of the TiSi2 layer 16 when the reflected light from the recording medium is detected by using a laser beam 380 namometer; therefore, the data is reproduced if the difference thereof is detected. The optical recording medium provided with the Si layer on the Ti layer has >=600 deg.C phase transition temp. and, therefore, the heat resistance is improved. |
