发明名称 PATTERN FORMING METHOD, MASK FORMING METHOD BY USING SAME, AND THIS MASK
摘要 <p>PURPOSE:To form a desired fine pattern in high precision by directly patterning a coating type glass film without using a resist. CONSTITUTION:The coating type glass SOG (spin-on-glass) film 23 is formed on an organic coating film 22 by the spin coating method, a substrate 21 is heat treated, a prescribed pattern is drawn by electron beams by using an electron beam drawing device, the substrate 21 is immersed into methanol to develop the film 23, and further rinsed with methanol, and dried to form the pattern 24. The glass film 23 is composed of a silanol compound and a solvent (methanol and the like), the silanol groups are dehydrated and allowed to condense with each other by irradiation with electron beams or ultraviolet rays and the film 23 in the exposed regions becomes difficultly soluble in the organic solvents, thus permitting the film 23 unexposed and nonpatterned regions to be removed and the desired fine pattern to be formed in high precision.</p>
申请公布号 JPH03287163(A) 申请公布日期 1991.12.17
申请号 JP19900084836 申请日期 1990.04.02
申请人 HITACHI LTD 发明人 IMAI AKIRA;HASEGAWA NORIO
分类号 G03F1/30;G03F1/68;G03F1/80;H01L21/027 主分类号 G03F1/30
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