发明名称 Semiconductor substrate and method for producing the same
摘要 A semiconductor substrate that comprises: a base plate member made from a dielectric material; a refractory metal film covering at least a part of the base plate member; a single crystal semiconductor film formed on the refractory metal film; and an impurities-diffusion layer formed in said single crystal semiconductor film in a side contacting with the refractory metla film. The diffusion layer has a density grade gradually decreasing toward a direction away from the refractory metal film so that this impurities-diffusion layer comes in ohmic contact with the refractory metal film.
申请公布号 US5073815(A) 申请公布日期 1991.12.17
申请号 US19900570426 申请日期 1990.08.21
申请人 RICOH COMPANY, LTD. 发明人 KOSAKA, DAISUKE;KONISHI, JUNICHI
分类号 H01L21/20;H01L21/285;H01L21/336;H01L27/00;H01L27/12;H01L29/41;H01L29/78;H01L29/786 主分类号 H01L21/20
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