| 摘要 |
A method for measuring refractive index of a thin film layer formed on the other layer having a known refractive index includes following steps. A step of irradiating P-polarized monochromatic light and S-polarized monochromatic light individually on the thin film layer with a prescribed angle of incidence, a step of determining reflections Rp and Rs for the P-polarized monochromatic light and S-polarized monochromatic light, respectively, by detecting luminous intensity of reflected light from the thin film layer, and a step of specifying the refractive index of the thin film layer by prescribed calculation either using the amount of phase changes produced by the reflection of said P-polarized light and S-polarized light on a boundary surface between the thin film layer and the medium, the phase changes being determined in accordance with the refractive index of the medium and the reflectances Rp and Rs, or using the amount of phase changes of lights during propagation from an upper surface of the thin film layer to a lower surface thereof the phase changes being determined in accordance with the refractive index of the medium and the reflectances Rp and Rs.
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