| 摘要 |
PURPOSE:To provide the title substrate having high absorptivity within a specific wavelength range, containing pyrazoline-based compound(s). CONSTITUTION:1-40 (pref. 5-35)wt.% of compound(s) of formula I (A is H or of formula II; B is of formula III, etc.; R<1> and R<2> are each H, halogen, alkyl, etc.; R<3> is H or alkyl; l is 0 or 1; m and n are each 1-3; X is 0 or imino; Y is H or phenyl) and/or formula IV (R<7> is H, halogen, alkyl, etc.; R<8> is H, halogen, alkoxy, etc.) is (are) added to a photosensitive resin and photosensitive resin substrate. The compound(s), the present additive, has high absorptivity for stationary waves produced by reflection from the substrate (esp. of wavelengths ranging from near ultraviolet to visible short wavelengths, i.e., 300 to 440nm), thus preventing irregular reflection due to the unevennesses on the substrate surface. Furthermore, the present additive has such advantage as excellent high-temperature treatment characteristics, improved solubility to organic solvents and no need of any yellow dye. |
