| 摘要 |
<p>PURPOSE:To improve the production efficiency of color filters by applying a resist material dispersed with a black pigment on the surface of a transparent substrate and exposing the resist material in the patterns for forming light shielding layers from the front and rear directions of the substrate, thereby patterning the resist material. CONSTITUTION:The mask 2 templated with the patterns A for forming the light shielding layers is disposed on the resist material 1 of the transparent substrate 3 coated with the resist material 1 dispersed with the black pigments and is exposed from the front and rear directions of the transparent substrate 3 to cure the parts for forming the light shielding layers of the resist material 1. The patterns B of the mask 6 is provided with the width (b) for forming the light shielding layer smaller than the width (a) for forming the light shielding layers in the patterns A by taking the irregular reflections by the transmission through the transparent glass substrate 3 into consideration. The resist material is then subjected to printing and developing by a photolithography method to form the light shielding layers, by which the color filters are obtd. The sure formation is executed by using the resist material in place of the conventional dyeing method for the light shielding layers. The production efficiency of the color filters is thus improved.</p> |
