发明名称 MULTIPLE VAPOR-DEPOSITED FILM AND ITS PRODUCTION
摘要 PURPOSE:To form a multicomponent synthetic solid soln. film on the surface of a substrate by vaporizing the multicomponent fine grain having a specified composition into the saturated vapor by the heat energy of high-temp. plasma having high-density activation energy, quenching and solidifying the vapor. CONSTITUTION:An aq. soln. of the complex salt having at least two kinds of elements other than water is reduced by alkali to form a crystal of the elements, and the salt component and moisture are removed to form a multicomponent fine grain 6. The fine grain 6 is introduced into the high-temp. plasma having high-density activation energy and vaporized into its saturated vapor, and the vapor is cooled and solidified to obtain a multicomponent synthetic film 3 on the surface of a substrate 11. At this time, the component mixing ratio of the grain 6 and the ratio of the amt. of the grain to that of the gas used are optionally selected, and the multicomponent vapor-deposited film having the desired composition is obtained.
申请公布号 JPH03285063(A) 申请公布日期 1991.12.16
申请号 JP19900320689 申请日期 1990.11.27
申请人 OGURA ATSUSHI 发明人 OGURA ATSUSHI
分类号 B22F9/24;C23C4/12;C23C14/08;C23C14/14;C23C14/24;C23C16/448;C23C16/452;C23C16/513 主分类号 B22F9/24
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