发明名称 WASTE GAS TREATMENT APPARATUS
摘要 <p>PURPOSE:To precisely detect the break-through by providing a load cell in contact with the bottom part of a waste gas treatment cylinder to detect its weight, furnishing the controller to receive the signal sent from the load cell, and operating an alarm means by the controller when the value of the detected weight exceeds a specified value. CONSTITUTION:The waste gas generated in a dry etching chamber 1 of semiconductor wafer is introduced into a waste gas treatment unit 20 where the adsorption treatment is carried out by adsorbet 13. The load cell 12 provided in contact with the bottom part of the waste gas treatment cylinder 7 detects the weight. The controller 8 receives the signal sent from the load cell 12 and operates a rotary display lamp 9. As a result, the detection of break-through is precisely carried out, and the exchanging time of the waste gas treatment cylinder is easily determined.</p>
申请公布号 JPH03284322(A) 申请公布日期 1991.12.16
申请号 JP19900082761 申请日期 1990.03.29
申请人 NEC CORP 发明人 ITO HIDEO
分类号 B01D53/46;B01D53/04;B01D53/30;B01D53/34;B01D53/68 主分类号 B01D53/46
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