| 摘要 |
<p>PURPOSE:To obtain flattened color filters in the same plane on a substrate by providing a flattening layer made of a transparent material, providing partition wall layers made of organic silicon material layers in an area on a scanning part on the flattening layer, and arranging the color filters. CONSTITUTION:This element is provided with a photodetection part 101 which performs photoelectric conversion, the scanning part 102 which leads out an electric signal generated by the photodetection part, and the flattening layer 103 made of the transparent material on the semiconductor substrate where a passivation film for protecting the photodetector part and scanning part is formed. Then the color filter 107-110 are arranged on the same plane opposite the photodetection part on the flattening layer across the organic silicon material 104. Consequently, the color filters 107-110 can be formed on the same plane in the area partitioned by the partition wall made of the organic silicon material layer 104, and high sensitivity and high resolution are obtained without variance in spectral sensitivity nor color blurring.</p> |
