发明名称 Semiconductor device having a heat sink.
摘要 <p>A semiconductor device having a semiconductor element (6) and a heat sink (1) radiating heat generated in the semiconductor element includes an amorphous semiconductor film (8) provided on the heat sink and the semiconductor element is put on the heat sink via the amorphous semiconductor film. Therefore, the stress, applied to the semiconductor element can be reduced because of the amorphous semiconductor film. In a construction where an amorphous semiconductor film comprising amorphous silicon or amorphous germanium is formed on the heat sink via a first metal film (9) and the semiconductor element is bonded to the amorphous semiconductor film via a second metal film (12), ohmic contact is made by alloys formed between the amorphous semiconductor film and the first and second metal film. Furthermore, in a construction where an amorphous semiconductor film is formed only at a region on the heat sink where the semiconductor element is put, and a metal film having electric resistance lower than that of the amorphous semiconductor film is formed on the amorphous semiconductor film and the heat sink, and the semiconductor element is formed on the heat sink via the amorphous semiconductor film and the metal film, a passage through which current flows is separated from a passage through which heat flows. <IMAGE></p>
申请公布号 EP0460785(A1) 申请公布日期 1991.12.11
申请号 EP19910300584 申请日期 1991.01.25
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SHIGIHARA, KIMIO;NAGAI, YUTAKA;AOYAGI, TOSHITAKA
分类号 H01L23/14;H01L21/28;H01L21/48;H01L21/52;H01L23/36;H01L23/373;H01L29/43;H01S5/00;H01S5/02;H01S5/022;H01S5/042 主分类号 H01L23/14
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