POSITIVE PHOTORESIST COMPOSITION,申请号EP19910101307-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	POSITIVE PHOTORESIST COMPOSITION
摘要
申请公布号	EP0440238(A3)	申请公布日期	1991.12.11
申请号	EP19910101307	申请日期	1991.01.31
申请人	FUJI PHOTO FILM CO., LTD.	发明人	UENISHI, KAZUYA;SAKAGUCHI, SHINJI;KOKUBO, TADAYOSHI
分类号	G03F7/023;C07C309/76;G03F7/022;H01L21/027;(IPC1-7):G03F7/022	主分类号	G03F7/023
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method for scheduling data packets and for creating base band frames from these data packets for a radio transmission

Bridge with turntable for the intersection of two vehicles with a jointed connection

Emergency stop switching device

System and method for automated transfer of technical documents and administration of transferred data in a database

Process and installation for combined sieving and non-ferrous metal separation

Clamping device for securing rods of concrete formwork

Device for temporarily sealing an aperture

Device and method for drawing a belt into a machine, in particular a paper machine, and drawing- in procedure

Device and method for testing the stability of hubs

Reaction and culture vessel for microorganisms and cell culture

Method of manufacturing superconducting cable

APPARATUS AND METHOD FOR SECURING BORDERWIRES TO MATTRESS INNERSPRINGS

Soldering structure of through hole

Communication system and receiving method

REMOVABLE INTERNAL AIR DIFFUSER

ANISOTROPIC CONDUCTIVE FILM AND METHOD FOR MANUFACTURING THE SAME

Extraction and adjustment tool for tangless inserts

SELF-TENSIONING TIE DOWN SYSTEM

ANALGESIC AND ANTI-INFLAMMATORY COMPOSITION