| 摘要 |
PURPOSE:To allow the detection of only the defect without entailing the erroneous detection by the positioned deviation, etc., of the pattern to be inspected and the reference pattern by applying space differential filters in plural different directions to the distribution of the densities of a pattern to be inspected and a reference pattern and detecting the defect based on the min. value. CONSTITUTION:A means 13 for inputting the two-dimensional pattern to be inspected as the image data having a density distribution of many values, a means 16 for inputting the reference pattern data corresponding to the pattern to be inspected and a means 17 for comparing respective sets of the data and determining the density difference between the pattern to be inspected and the reference pattern are provided. A means 18 for applying the spatial derivative filters in the plural different directions to the distribution of the density differences and determining the min. value of the absolute values thereof and a means 19 for detecting the defect in accordance with the determined min. value are provided. The erroneous defect detection occurring in the deviation, etc., in the resist process and position, is eliminated and only the defect is efficiently detected. |
