发明名称 PROCESS FOR EXPOSING A PHOTOSENSITIVE RESIN COMPOSITION TO LIGHT
摘要 The present invention provides an improved process by which dissolved oxygen is effectively removed from a photosensitive resin layer of a photosensitive resin plate. The process comprises preliminary exposing to light the photosensitive resin plate to quench oxygen dissolved in said photosensitive resin layer before conducting a main exposure, wherein the photosensitive resin layer is prepared from a photosensitive resin composition which comprises, (a) a polymer binder, (b) a radically polymerizable monomer, (c) a sensitizing dye, and (d) a photopolymerization initiator which is excited by a light of a different wave length from a light exciting the sensitizing dye, the preliminary exposure is conducted with a light only exciting the sensitizing dye and the main exposure is conducted with a light exciting the photopolymerization initiator.
申请公布号 CA2043822(A1) 申请公布日期 1991.12.06
申请号 CA19912043822 申请日期 1991.06.04
申请人 NIPPON PAINT CO., LTD. 发明人 KAWAGUCHI, CHITOSHI;ARIMATSU, SEIJI;KONISHI, KATSUJI;KANDA, KAZUNORI
分类号 G03F7/20;(IPC1-7):G03F7/028;G03F7/031;G03F7/033 主分类号 G03F7/20
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